US MATCH Act proposal would ban all immersion DUV exports to China and tighten servicing curbs

Trade press reported on a US bill, the MATCH Act, that would ban exports of all deep-ultraviolet immersion lithography machines to China and further restrict servicing there. It would push allies, including the Netherlands, to match the controls, with a unilateral US fallback if they do not. Current Dutch rules only partly restrict immersion sales, so the bill would widen a restriction that already covers part of ASML's China DUV business.

• Would ban exports of all immersion DUV machines to China
• Would further restrict servicing of tools in China, which Dutch rules still allow
• Allies would be pressed to align; the US could act alone if they do not
• Current Dutch rules restrict only more advanced immersion models