Applied launches Precision Selective Nitride PECVD and Endura Trillium ALD for 2nm-class chips

Applied introduced two deposition systems aimed at 2-nanometer-class logic. Precision Selective Nitride PECVD targets shallow trench isolation, and Endura Trillium ALD targets metal gate stacks in gate-all-around transistors with angstrom-level thickness control. Applied says leading foundry and logic customers are already adopting both, but it does not name them and gives no revenue figures.

• Precision Selective Nitride PECVD: shallow trench isolation with lower parasitic capacitance
• Endura Trillium ALD: metal gate stacks in gate-all-around transistors
• GAA transistors can require more than 500 process steps
• No customers named and no revenue figures disclosed