High-NA EUV (EXE platform)
First production-class EXE:5200B High-NA scanner reported in 2025; customer ramp is the next test.
What it is
High-NA EUV uses a larger lens numerical aperture (0.55) to print finer features than current EUV, aimed at the most advanced chip nodes. The EXE:5200B is designed for high-volume manufacturing, with a reported 60% productivity boost over its predecessor. ASML had recognized revenue on only three High-NA systems as of mid-2025.
Why it matters to the stock. High-NA is the next pricing step for EUV. Adoption by Intel and memory makers decides whether ASML's EUV revenue keeps rising after 2026.
News
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